dielectric process

英 [ˌdaɪɪˈlektrɪk ˈprəʊses] 美 [ˌdaɪɪˈlektrɪk ˈprɑːses]

网络  电介质处理过程

计算机



双语例句

  1. Analysis of Dielectric Recovery Strength and Reignition Process in Iron Splitters Chambers of AC Contactor
    接触器栅片灭弧室介质恢复强度及重燃过程的分析
  2. The high performance of this product is a result of the Intersil Dielectric Isolation process.
    该产品是一种高性能的Intersil的介质隔离过程的结果。
  3. It can be used to analyze time domain parameters of dielectric sample, simplify the process of solving spectrum, and give the ultralow frequency domain spectrums of complex dielectric constant.
    它可分析电介质样品的时域参数,简化傅里叶变换计算过程,得出样品的超低频介电谱。
  4. Dielectric barrier discharge ( DBD) process has become a highlight in research due to its advantages such as higher removal efficiency, lower energy consumption and less ground demand.
    介质阻挡放电(DBD)由于具有分解效率高、能耗低、占地少等特点而逐渐成为研究的热点。
  5. In this dissertation, we will investigate the application of several high-k dielectric and metal gate process technologies.
    在本论文中,吾人将探讨数种高介电系数介电层与金属闸极的研究与应用。
  6. Research Progresses in Treatment of Wastewater Containing Refractory Organic Compounds by Dielectric Barrier Discharge Plasma Process
    介质阻挡放电等离子体技术处理难降解有机废水的研究进展
  7. It has been designed and constructed with the Intersil High Frequency Bipolar Dielectric Isolation process and features dynamic parameters never before available from a truly differential device.
    这已被设计与Intersil的高频双极电介质隔离工艺构造和特点,从一个以前从未真正差速器可用的动态参数。
  8. The dielectric barrier surface discharge process is simulated using Poisson's equation and drift-diffusion equation and the distribution history of electron, ion and electric field is gained.
    采用泊松方程和漂移-扩散方程对介质阻隔面放电进行数值模拟,得到了电子、离子以及电场分布随时间的变化。
  9. Temperature and dielectric property of resin during RTM process
    RTM工艺中树脂固化温度与介电性能
  10. Transient voltage in a power system significantly affects the dielectric strength recovery of a vacuum switch. Depending on whether or not this effect is taken into consideration, the dielectric recovery process can be divided into actual recovery and inherent recovery processes.
    电力系统的瞬态恢复电压对真空开关的介质强度恢复影响极大,根据是否考虑这一影响可把真空开关的介质恢复过程分为实际恢复过程和固有恢复过程。
  11. A Compatible Technology of SOI Full Dielectric Isolation with Complementary Bipolar Process
    SOI全介质隔离与高频互补双极兼容工艺
  12. Then, a dynamic mathematical model of the dielectric recovery process was made, and a group of equations, including mass conservation equation, momentum conservation equation, energy conservation equation and state equation, were built.
    然后建立了一般吹气式气体火花开关绝缘恢复的动态数学模型,得到了包括质量守恒方程、动量守恒方程、能量守恒方程和状态方程等的一个完备方程组;
  13. Studies on the Dielectric Analysis of the Cure Process of Epoxy Resin-Low Molecular Polyamide
    环氧树脂/低分子聚酰胺固化过程的介电分析研究
  14. The paper expounds the quantitative models of dielectric recovery process and voltage recovery process in contact gap, compares the theory criterions about various contacts breaking capacities, and discusses the importance of increasing breaking capacity by optimum seeking and improving contact material.
    阐述了触头间隙介质恢复过程和电压恢复过程的定量模型,分析比较了已有的触头分断能力理论判据,论述了触头材料的优选与改进对提高分断能力的重要性。
  15. Use of dielectric combination measurement in process analysis
    介电组合测量法用于流程分析的研究
  16. In this paper, Sn-doped BST thin films with excellent dielectric property were prepared by Sol-Gel process. And the fine patterning of the films was fabricated by chemical modified method.
    本文旨在采用Sol-Gel法,通过掺杂Sn元素改善BST薄膜的介电性能,并采用溶胶&凝胶与化学修饰相结合的新技术制得BST薄膜的微细图形。
  17. The application of measurement method of dielectric spectra on the study of hydration process of cement
    介电谱测量法在水泥水化过程研究中的应用
  18. This-Simple delecting/ diagnostic technique is very useful in developing low-density dielectric growth process and process technologies with good stress match.
    它将为研究针孔密度低的介质生长工艺和应力匹配性能优良的工艺技术提供一种简便的检测诊断方法。
  19. A monolithic high speed wide band voltage feedback operational amplifier is developed using dielectric isolation complementary bipolar process.
    介绍了一种采用介质隔离互补双极工艺制造的单片高速宽带电压反馈型运算放大器。
  20. Sythesis of Lead Magnesium Niobate-Lead Titanate Dielectric Ceramic Powder by a Coprecipitation Process
    共沉淀法合成铌镁酸铅&钛酸铅介电陶瓷粉末
  21. There are higher dielectric strength and faster recovery process of dielectric strength when interrupting current decreasing.
    开断电流减小,介质强度恢复的速度快,介质强度高。
  22. Also, a mathematical model of the dielectric recovery process of a axially-blown gas spark gap, and a group of simplified hydromechanical equations were made.
    建立了纵吹式气体开关绝缘恢复过程的数学模型,得到了一个简化流体力学方程组。
  23. The preparation of thick polyimide dielectric layer and the etching process are basis and key process of microwave multiplayer circuit. Its thickness concordance, uniformity, repeatability and stability determine the property of the microwave circuit.
    厚层聚酰亚胺介质层制备及刻蚀工艺是微波多层电路的基础和关键工艺,其厚度一致性、均匀性、可重复性、稳定性决定了微波电路的性能。
  24. Preparation of SiOF Low Dielectric Constant Thin Film by Sol-gel Process
    溶胶-凝胶法制备掺氟二氧化硅低介电常数薄膜
  25. As abrasive particles for silicon wafer and silica dielectric layer in CMP process, CeO_2 nanoparticles have more advantages of higher smoothness, higher velocity and better selectivity than SiO_2 nanoparticles.
    以纳米CeO2代替SiO2作为硅片和SiO2介质层CMP过程的研磨粒子,具有平整质量更高、抛光速率更快、选择性更好的优点。
  26. Microwave integrated technology, and a variety of materials with low dielectric loss occurs, microstrip antenna production process is greatly guaranteed.
    微波集成技术的发展,以及各种低介质损耗材料的出现,微带天线的制作工艺得到保证。
  27. The paper introduced an experimental apple non-destructive inspection system based on fruits 'dielectric properties, the method and the process of it.
    介绍了苹果介电特性的无损检测系统的原理、方法和测量过程。
  28. Doping of Ni/ Co did not change the phase structure, but increased the dielectric loss capacity. The dielectric polarization process was ascribed to ionic polarization.
    经过Ni掺杂、Co掺杂以及Ni/Co共掺杂后,产物的形貌、晶相变化不明显,但介电损耗强度增大,主要极化机理归因于离子极化。
  29. Its main advantage is that the interaction between dielectric and magnetic field during the process of testing does not affect all kinds of physical and chemical nature of the detecting objects.
    其主要优势在于进行检测的过程当中采用磁场与介质之间相互作用,可以做到不影响被检测物体的本身物理及其化学等各种自身性质。
  30. The diagnosis shows that the uniform dielectric barrier discharge process is mainly affected by change of power supply and reactive gas components. The electron energy will increase with the increasing plasma discharge power and thus cause the plasma discharge gradually appearing two rapid changes in the reaction area.
    常压下的均匀介质阻挡放电过程主要受到放电功率和反应气体组成两个参数的影响,随着放电功率的增加等离子体中的电子能量也随之提升,使得等离子体中的反应体系会逐步出现两次转变。